Polybell Services
Advanced Optical Ellipsometry System for Precision Film Analysis
At Polybell International, we provide industry-leading technology designed to meet the evolving needs of material analysis and characterization. Our Optical Ellipsometry System from J.A. Woollam, model M-2000UI, represents cutting-edge performance for the non-destructive evaluation of thin films. This system enables detailed analysis of film thickness, optical constants, and surface properties with unmatched precision, offering critical data to researchers and manufacturers across a variety of industries, including semiconductors, optics, electronics, and materials science.
The Science Behind Ellipsometry
Ellipsometry utilizes the interaction between polarized light and a material’s surface to obtain critical data. When polarized light is reflected from a sample, its phase and amplitude are altered. These changes provide detailed information about the sample’s optical properties, such as refractive index, extinction coefficient, and film thickness. By using these measurements, researchers can accurately determine the material characteristics of a wide variety of films, from dielectric and semiconductor layers to organic and inorganic thin films.
Sample Specifications and Measurement Capabilities
The Optical Ellipsometry System provides unmatched flexibility in terms of sample compatibility, offering a broad range of material and film analysis possibilities:
● Sample Requirements:
○ Size: 2×2 cm² to 20×20 cm²
○ Types: Glass, Si Wafer, PET, and other substrate materials
○ Film Thickness Range:
■ Dielectric Films: 50 ~ 5000 nm
■ Metal Films: 10 ~ 50 nm
● Measurable Items:
○ Ellipsometric Parameters: Material-specific parameters Ψ (amplitude ratio) and Δ (phase difference) ○ Transmittance (T): Measurement of light penetration and transmission through the sample
● Additional Analytical Capabilities (requires blank substrate):
○ Single-layer thin film optical constants (n, k) analysis
○ Substrate optical constants establishment
○ Film thickness measurements
○ Film surface roughness trends
○ Multilayer film analysis and individual layer measurement
Why Choose Polybell’s Optical Ellipsometry System?
Unrivaled Precision
Our Optical Ellipsometry System delivers precise, accurate measurements of film thickness, optical constants, and surface properties, ensuring that you get the exact data you need for your applications.
Non-Destructive Testing
This system enables you to analyze delicate and expensive materials without causing any damage, ensuring that your samples remain intact throughout the testing process.
Versatility Across Industries:
Whether you work in semiconductor manufacturing, optics, electronics, or material science, Polybell’s Optical Ellipsometry System provides the versatility and precision required to achieve your research and production goals.
Comprehensive Data and Analysis
Our system’s ability to measure multiple parameters and provide detailed analysis ensures that you gain a complete understanding of your material properties, from surface roughness trends to multilayer film analysis.
The Polybell Advantage in Optical Ellipsometry
Polybell International is committed to providing the latest in material analysis technology to ensure that our customers receive precise, reliable, and actionable data. Our Optical Ellipsometry System is the perfect solution for advanced research and industrial applications, offering non-destructive analysis with unmatched accuracy.
Dual Light Source for Comprehensive Spectral Analysis
Equipped with Deuterium (D2) for UV/VIS and Quartz Tungsten Halogen (QTH) for VIS/IR, the system covers a broad spectrum from 190 ~ 1680 nm. This ensures precise measurements across the ultraviolet, visible, and infrared regions, making it highly versatile for a range of applications.
Ellipsometry and Transmission Spectrum Capabilities
The system measures ellipsometric parameters, reflection spectrum (45 ~ 75°), and transmission spectrum (90°), allowing for the comprehensive analysis of thin films, including multilayer stacks.
Precise Measurement and Non-Destructive Testing
By measuring the amplitude ratio (Ψ) and phase difference (Δ) of the S and P polarization components of light, this system determines the refractive index, extinction coefficient, and film thickness without damaging the sample. This non-invasive approach is essential for delicate and expensive materials such as
semiconductor wafers and specialized coatings.
Key Features of the Optical Ellipsometry System
Semiconductor & Optoelectronics
In high-tech industries, our metal coating equipment offers precision coatings that enhance the functionality and performance of semiconductor wafers and optical devices. Polybell’s coatings provide uniformity and precision, ensuring reliable operation in demanding environments.
Study Cases – Real-World Applications
Polybell’s Optical Ellipsometry System has been employed in multiple real-world applications, providing critical insights into material properties. Below are examples demonstrating the system’s capabilities:
1. Al-doped ZnO (AZO) Single-Layer Film Measurement:
○ The system measured ellipsometric parameters and transmittance of an AZO single-layer film on B270 Glass. The resulting data provided valuable insights into the film’s optical constants and thickness, helping researchers optimize film performance for optoelectronic applications.
2. Optical Constant and Thickness Analysis:
○ Detailed fitting results of the AZO single-layer film were obtained, which included the refractive index, extinction coefficient, and thickness measurements. These results are crucial for fine-tuning the deposition process and improving material properties in advanced coatings and electronic devices.
Recommended Equipment
Optical Ellipsometry System (M-2000UI, J.A. Woollam): This advanced system is designed for precise film analysis, offering a wide range of capabilities, including non-destructive testing, ellipsometric parameter measurement, and multilayer film analysis.
Experience Precision and Innovation with Polybell
By choosing Polybell International’s Optical Ellipsometry System, you gain access to state-of-the-art technology that delivers unparalleled accuracy and reliability for thin film analysis. Whether you are conducting research or advancing your manufacturing processes, our equipment provides the precision and insight needed to optimize performance and drive innovation.
Contact Polybell International today to learn more about how our Optical Ellipsometry System can elevate your research, development, and manufacturing capabilities. Let us help you achieve superior results with cutting-edge technology and award-winning solutions.
