Polybell Services
Polybell International Co., LTD. – ALD System
Polybell International Co., LTD. proudly introduces the ALD System, an advanced solution for precise, atomic-level deposition that revolutionizes the thin-film deposition process.
Atomic Layer Deposition (ALD) offers significant advantages over traditional Chemical Vapor Deposition (CVD), Plasma-Assisted Chemical Vapor Deposition (PECVD), and sputtering technologies, making it an essential tool in semiconductor manufacturing, nanotechnology, and advanced material coatings. By dividing the CVD reaction process into two half-reactions, ALD enables the controlled growth of materials at the atomic level, ensuring exceptional precision, uniformity, and coverage.
Why Choose Polybell’s ALD System?
When you choose Polybell International, you choose a partner dedicated to excellence in thin-film deposition. Here’s why Polybell’s ALD System is the superior choice for your advanced coating needs:
Unrivaled Precision
Polybell’s ALD system allows for atomic-level control over film thickness, ensuring that your coatings are applied precisely. This level of control is essential for applications where even the slightest variations in thickness can impact performance.
Superior Uniformity and Coverage
With a mistiness rate of less than 2%, Polybell’s ALD system ensures that your coatings are uniform across the entire surface, even in structures with high aspect ratios. This uniformity is critical to achieving consistent results, especially in complex geometries and high-performance materials.
Wide Range of Applications
From semiconductors and biomedical devices to electroluminescent materials and gas barriers, Polybell’s ALD system is versatile enough to meet the needs of various industries. Our system allows you to confidently explore new materials and applications, knowing that your coatings will be applied with precision and reliability.
Low-Temperature Processing
Our ALD system operates at lower temperatures than traditional methods, making it ideal for coating heat-sensitive materials. This low-temperature capability expands the range of materials that can be coated, ensuring that your products are protected without risking thermal damage.
Dense and Defect-Free Films
The ALD system produces dense, pinhole-free coatings that provide superior protection and performance.
Whether you need a gas barrier, a biomedical coating, or a dielectric material, Polybell’s ALD system delivers high-quality films that meet the most demanding specifications.
Dense and Pinhole-Free Coatings
The ALD system produces dense, high-quality films free from pinholes and other defects. These characteristics are essential for applications requiring high-performance materials, including gas barriers, biomedical coatings, and semiconductor devices.
Enhanced Precursor Transport Efficiency
The ALD system features a specially designed chamber cavity flow channel that optimizes the efficiency of precursor transportation. This innovation ensures that precursor materials are delivered consistently and evenly across the substrate, producing high-quality, uniform coatings.
Atomic-Level Precision
With ALD, the material is deposited one atomic layer at a time, allowing for atomic-level control over film thickness. This precision ensures that coatings meet the specifications required for modern applications, including ultra-thin films and high-dielectric materials.
Exceptional Thickness Uniformity
Polybell’s ALD system offers industry-leading thickness uniformity, with a mistiness rate of less than 2%. The system delivers excellent step coverage even in complex structures with high aspect ratios, ensuring consistent film growth across the entire surface.
Key Features of Polybell’s ALD System:
Low-Temperature Processing
The ALD process operates at lower temperatures than traditional methods, making it ideal for heat-sensitive materials and applications. This low-temperature capability allows for a broader range of material compatibility, ensuring that your products are coated with precision without risking thermal damage.
Polybell’s ALD system delivers high-quality Al2O3 gas barrier films that protect sensitive electronics, packaging, and other applications requiring advanced moisture and gas barrier properties.
Polybell’s ALD system delivers high-quality Al2O3 gas barrier films that protect sensitive electronics, packaging, and other applications requiring advanced moisture and gas barrier properties.
Transparent Conductive Films
The ALD system can deposit ZnO: Al and ITO films, providing transparent conductive coatings essential for touchscreens, displays, and solar cells. These films offer excellent conductivity and transparency, ensuring optimal performance in electronic and optical devices.
High Dielectric Materials
Polybell’s ALD system is perfect for coating high-dielectric materials like Al2O3, HfO2, ZrO2, and Ta2O5. These materials are crucial in semiconductor manufacturing, where precise dielectric properties are required to fabricate microelectronics and advanced circuits.
Catalyst Coatings
The ALD system can deposit catalytic materials such as Pt, Ir, Co, and TiO2 with atomic precision, ensuring that the coatings provide optimal performance in catalytic processes for industrial and environmental applications.
Biomedical Coatings
For medical devices and implants, the ALD system produces biocompatible coatings such as TiN, ZrN, and CrN. These coatings improve the performance, durability, and safety of biomedical devices, ensuring they meet the highest standards for health and safety.
Applications of Polybell’s ALD System:
Semiconductor & Optoelectronics
In high-tech industries, our metal coating equipment offers precision coatings that enhance the functionality and performance of semiconductor wafers and optical devices. Polybell’s coatings provide uniformity and precision, ensuring reliable operation in demanding environments.
Electroluminescent Materials
The system can also deposit electroluminescent materials like SrS: Cu, ZnS: Mn, and ZnS: Tb. These materials are essential in applications such as OLED displays, lighting, and other electronic devices where light emission is critical.
The Future of Thin-Film Deposition with Polybell
Polybell International’s ALD System represents the cutting edge of thin-film deposition technology. Our ALD system delivers the highest quality coatings for a wide range of advanced applications by offering atomic-level precision, uniform thickness control, and low-temperature processing.
Whether you are developing next-generation semiconductors, biomedical devices, or optoelectronic materials,
Polybell’s ALD system provides the precision, reliability, and efficiency needed to succeed in today’s competitive markets.
Choose Polybell International for your atomic layer deposition needs.
Our ALD system provides the precision, flexibility, and performance required to succeed in today’s high-tech industries. Contact us today to discover how Polybell’s advanced coating technologies can transform your production processes and help you achieve superior results.